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January 30, 2006
Intel still looking for the perfect EUV light source
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Intel Capital invested an undisclosed amount in XTREME technologies GmbH, based in Göttingen, Germany to “accelerate” development of its extreme ultraviolet (EUV) light sources, which go into chip manufacturing equipment (lithography tools).
According to several articles in the EE Times over the past year or two, Intel needs beta EUV lithography tools soon if it wants to keep to its roadmap for next generation chip sizes.
XTREME technologies was founded in 2001 and is a spinoff of Jenoptik AG (a laser and microelectronics manufacturer and once the primary laser producer for the former Soviet bloc), which shares ownership of the startup with Japan’s Ushio.
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Xtreme Technologies demonstrates that the smaller the integrated circuits, the bigger the laser
Intel is backing a number of startups in the EUV market. In 2004 it invested in Cymer (San Diego), which also makes EUV light sources and in 2005 it invested in Italy’s Media Lario, which makes the micro-mirrors required to focus the light beams.
There are a few others in the race that Intel Capital has not invested in yet: Japan's Gigaphoton Corp (also partly owned by Ushio), Energetiq Technology based in Woburn, MA and Philips Xtreme UV GmbH in Aachen, Germany
Posted on January 30, 2006 07:57 AM | Posted to Semiconductors | Venture Capital | Permalink
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